Modular nonlinear hybrid plasmonic circuit.

Photonic integrated circuits (PICs) are revolutionizing nanotechnology, with far-reaching applications in telecommunications, molecular sensing, and quantum information. PIC designs rely on mature nanofabrication processes and readily available and optimised photonic components (gratings, splitters, couplers). Hybrid plasmonic elements can enhance PIC functionality (e.g., wavelength-scale polarization rotation, nanoscale optical volumes, and enhanced nonlinearities), but most PIC-compatible designs use single plasmonic elements, with more complex circuits typically requiring ab initio designs. Here we demonstrate a modular approach to post-processes off-the-shelf silicon-on-insulator (SOI) waveguides into hybrid plasmonic integrated circuits. These consist of a plasmonic rotator and a nanofocusser, which generate the second harmonic frequency of the incoming light. We characterize each component's performance on the SOI waveguide, experimentally demonstrating intensity enhancements of more than 200 in an inferred mode area of 100 nm2, at a pump wavelength of 1320 nm. This modular approach to plasmonic circuitry makes the applications of this technology more practical.

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask.

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm-1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL-NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.

Reducing Rowland ghosts in diffraction gratings by dynamic exposure near-field holography.

Near-field holography (NFH) combined with electron beam lithography (EBL)-written phase masks is a promising method for the rapid realization of diffraction gratings with high resolution and high accuracy in line density distribution. We demonstrate a dynamic exposure method in which the grating substrate is shifted during pattern transfer. This reduces the effects of stitching errors, resulting in the decreased intensity of the optical stray light (i.e., Rowland ghosts). We demonstrate the intensity suppression of ghosts by 60%. This illustrates the potential for dynamic NFH to suppress undesirable periodic patterns from phase masks and alleviate the stitching errors induced by EBL.

175 nm period grating fabricated by i-line proximity mask-aligner lithography.

We report the fabrication of periodic structures with a critical dimension of 90 nm on a fused silica substrate by i-line (λ=365 nm) proximity mask-aligner lithography. This realization results from the combination of the improvements of the optical system in the mask aligner (known as MO exposure optics), short-period phase-mask optimization, and the implementation of self-aligned double patterning (SADP). A 350 nm period grating is transferred into a sacrificial polymer layer and coated with an aluminum layer. The removal of the metal initially present on the horizontal surfaces and on top of the polymer grating leaves a 175 nm period grating on the wafer, which can be used as a wire grid polarizer. A computation of the efficiency is performed from the measured profile and confirms the deep-blue visible to infra-red operation range.

Fabrication of free-standing lithium niobate nanowaveguides down to 50 nm in width.

Nonlinear optical nanoscale waveguides are a compact and powerful platform for efficient wavelength conversion. The free-standing waveguide geometry opens a range of applications in microscopy for local delivery of light, where in situ wavelength conversion helps to overcome various wavelength-dependent issues, such as biological tissue damage. In this paper, we present an original patterning method for high-precision fabrication of free-standing nanoscale waveguides based on lithium niobate, a material with a strong second-order nonlinearity and a broad transparency window covering the visible and mid-infrared wavelength ranges. The fabrication process combines electron-beam lithography with ion-beam enhanced etching and produces nanowaveguides with lengths from 5 to 50 µm, widths from 50 to 1000 nm and heights from 50 to 500 nm, each with a precision of few nanometers. The fabricated nanowaveguides are tested in an optical characterization experiment showing efficient second-harmonic generation.

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography.

Diffractive mask-aligner lithography allows printing structures that have a sub-micrometer resolution by using non-contact mode. For such a purpose, masks are often designed to operate with monochromatic linearly polarized light, which is obtained by placing a spectral filter and a polarizer in the beam path. We propose here a mask design that includes a wire-grid polarizer (WGP) on the top side of a photo-mask and a diffractive element on the bottom one to print a 350 nm period grating by using a classical mask-aligner in proximity exposure mode. Linearly polarizing locally an unpolarized incident beam is only possible by using a WGP on the top side of the mask. This configuration opens the possibility to use different linear polarization orientation on a single mask and allows to print high resolution structures with different orientation within one exposure.

Encapsulation process for diffraction gratings.

Encapsulation of grating structures facilitates an improvement of the optical functionality and/or adds mechanical stability to the fragile structure. Here, we introduce novel encapsulation process of nanoscale patterns based on atomic layer deposition and micro structuring. The overall size of the encapsulated structured surface area is only restricted by the size of the available microstructuring and coating devices; thus, overcoming inherent limitations of existing bonding processes concerning cleanliness, roughness, and curvature of the components. Finally, the process is demonstrated for a transmission grating. The encapsulated grating has 97.5% transmission efficiency in the -1st diffraction order for TM-polarized light, and is being limited by the experimental grating parameters as confirmed by rigorous coupled wave analysis.

Fabrication of nanoscale lithium niobate waveguides for second-harmonic generation.

Nanoscale waveguides are basic building blocks of integrated optical devices. Especially, waveguides made from nonlinear optical materials, such as lithium niobate, allow access to a broad range of applications using second-order nonlinear frequency conversion processes. Based on a lithium niobate on insulator substrate, millimeter-long nanoscale waveguides were fabricated with widths as small as 200 nm. The fabrication was done by means of potassium hydroxide-assisted ion-beam-enhanced etching. The waveguides were optically characterized in the near infrared wavelength range showing phase-matched second-harmonic generation.

Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide.

The influence of the oxygen plasma parameters on the morphology and optical properties of TiO2 thin films has been extensively analyzed in plasma enhanced atomic layer deposition (PEALD) processes. Crystalline aggregates with the anatase phase have been identified on the film surface at a low deposition temperature (down to 70 °C) under specific plasma conditions. Up to 70% surface coverage by anatase crystallites is obtained at low oxygen gas flow rates and high plasma power. The hillocks abundance is correlated with high ion flux and electron density and with the resulting enhanced ion bombardment of the surface. Altering the plasma conditions is an important parameter besides temperature to control the morphology of the titania film for specific applications such as photocatalysis or functional optical coatings. Specifically, photocatalytic titania coatings on polymer substrates could benefit of such low temperature PEALD processes with abundant anatase crystallites; whereas optical coatings require smooth, high refractive index titania as obtained with low plasma power and high oxygen flow rate.

Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS.

In this study, the influence of direct current (DC) biasing on the growth of titanium dioxide (TiO2) layers and their nucleation behavior has been investigated. Titania films were prepared by plasma enhanced atomic layer deposition (PEALD) using Ti(OiPr)4 as metal organic precursor. Oxygen plasma, provided by remote inductively coupled plasma, was used as an oxygen source. The TiO2 films were deposited with and without DC biasing. A strong dependence of the applied voltage on the formation of crystallites in the TiO2 layer is shown. These crystallites form spherical hillocks on the surface which causes high surface roughness. By applying a higher voltage than the plasma potential no hillock appears on the surface. Based on these results, it seems likely, that ions are responsible for the nucleation and hillock growth. Hence, the hillock formation can be controlled by controlling the ion energy and ion flux. The growth per cycle remains unchanged, whereas the refractive index slightly decreases in the absence of energetic oxygen ions.

Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning.

Substantial discrepancies are commonly observed when comparing the predicted and measured optical performance of deep-ultraviolet tungsten wire grid polarizers. Particularly, the extinction ratio is strongly impaired. Therefore, we investigate major differences between assumed and actual achieved properties regarding geometry and material of the grating structure as the origin of theses discrepancies. We find an improvement potential for the extinction ratio of one order of magnitude by improving the material and a factor of four by improving the geometry. Our results allow for a purposeful revision of fabrication processes and will therefore significantly contribute to the improvement of deep-ultraviolet wire grid polarizers.

Top-up fabrication of gold nanorings.

A simple method for the fabrication of gold nanorings with reliable material composition and reproducible morphology that relies on a combination of top-down and bottom-up techniques is presented. Here, lithographically defined hole arrays are used as templates for the deposition of gold nanoparticles. The resulting gold nanoparticle rings are joined by electroless deposition of gold, thereby leading to the formation of gold nanoring arrays that show plasmonic resonance in their optical spectra at theoretically predicted wavelengths. In addition, the gold nanorings can be released from the template by extensive rinsing with water, thereby enabling their further functionalization or assembly and the re-use of the template for the preparation of more nanorings.

Silicon wire grid polarizer for ultraviolet applications.

We present a silicon wire grid polarizer operating down to a wavelength of 300 nm. Besides metallic grating materials, semiconductors also offer appropriate material properties to realize wire grid polarizers in the ultraviolet (UV) spectral range. The presented polarizer with a period of 140 nm was realized by means of electron beam lithography and dry etching using amorphous silicon as the grating material. At a wavelength of 365 nm, a transmission of 42% and an extinction ratio of 90 (19.5 dB) are measured. The spectral bandwidth of these polarizers in the UV-spectral range is about 100 nm.

Second-harmonic generation in lithium niobate nanowires for local fluorescence excitation.

We study the nonlinear optical properties of lithium niobate (LiNbO(3)) nanowires (NWs) fabricated by a top-down ion beam enhanced etching method. First, we demonstrate generation and propagation of the second-harmonic (SH) light in LiNbO(3) NWs of typical rectangular cross-sections of 400 x 600 nm(2) and length from 10 to 50 µm. Then, we show local fluorescent excitation of 4',6-diamidino-2-phenylindole (DAPI) dye with the propagated SH signal in standard concentrations as for biological applications. By measuring the detected average power of the propagated fundamental harmonic (FH) and the SH signal at the output of the NWs, we directly prove the dominating role of the SH signal over possible two-photon excitation processes with the FH in the DAPI dye. We estimate that 63 ± 6 pW of the propagated SH average power is required for detectable dye excitation. Finally, we model the waveguiding of the SH light to determine the smallest NW cross-section (around 40x60 nm(2)) which is potentially able to excite fluorescence with a FH intensity below the cell damage threshold.

Coupled grating reflectors with highly angular tolerant reflectance.

We report on stacked high-contrast grating reflectors with virtually angular independent reflectance for transverse-magnetic polarized light. The investigated structure consists of two-layer pairs of amorphous silicon and silicondioxide that are designed for a wavelengths of 1550 nm. The large angular tolerance results from coupling of the two involved silicon gratings and is achieved if the modal fields in the reflectors are matched. With this approach, a reflectance of more than 96% in the entire angular spectrum is feasible. Experimentally we demonstrate a reflectance of more than 98% for incidence angles up to 60° and more than 90% up to 80°.

Comparison of different simulation methods for effective medium computer generated holograms.

The arrangement of binary subwavelength structures is a promising alternative to the conventional multiheight level technique to generate computer generated holograms (CGHs). However, the current heuristic design approach leads to a slight mismatch between the target signal and experimental data. To evaluate this deviation, a diffractive beam splitter design is investigated rigorously using a finite-difference time-domain (FDTD) method. Since the use of a rigorous Maxwell-equation solver like FDTD requires a massive computational effort, an alternative scalar approach, a fast Fourier transform beam propagation method (FFT-BPM), is investigated with a substantial higher computing speed, showing still a good agreement with the FDTD simulation and experimental data. Therefore, an implementation of this scalar approach into the CGH design process offers the possibility to significantly increase the accuracy.

Michelson interferometer with diffractively-coupled arm resonators in second-order Littrow configuration.

Michelson-type laser-interferometric gravitational-wave (GW) observatories employ very high light powers as well as transmissively-coupled Fabry-Perot arm resonators in order to realize high measurement sensitivities. Due to the absorption in the transmissive optics, high powers lead to thermal lensing and hence to thermal distortions of the laser beam profile, which sets a limit on the maximal light power employable in GW observatories. Here, we propose and realize a Michelson-type laser interferometer with arm resonators whose coupling components are all-reflective second-order Littrow gratings. In principle such gratings allow high finesse values of the resonators but avoid bulk transmission of the laser light and thus the corresponding thermal beam distortion. The gratings used have three diffraction orders, which leads to the creation of a second signal port. We theoretically analyze the signal response of the proposed topology and show that it is equivalent to a conventional Michelson-type interferometer. In our proof-of-principle experiment we generated phase-modulation signals inside the arm resonators and detected them simultaneously at the two signal ports. The sum signal was shown to be equivalent to a single-output-port Michelson interferometer with transmissively-coupled arm cavities, taking into account optical loss. The proposed and demonstrated topology is a possible approach for future all-reflective GW observatory designs.

Durability of stochastic antireflective structures--analyses on damage thresholds and adsorbate elimination.

We fabricated stochastic antireflective structures (ARS) and analyzed their stability against high power laser irradiation and high temperature annealing. For 8 ps pulse duration and 1030 nm wavelength we experimentally determined their laser induced damage threshold to 4.9 (±0.3) J/cm(2), which is nearly as high as bulk fused silica with 5.6 (±0.3) J/cm(2). A commercial layer stack reached 2.0 (±0.2) J/cm(2). An annealing process removed adsorbed organics, as shown by XPS measurements, and significantly increased the transmission of the ARS. Because of their monolithic build the ARS endure such high temperature treatments. For more sensitive samples an UV irradiation proved to be capable. It decreased the absorbed light and reinforced the transmission.

Circular dichroism from chiral nanomaterial fabricated by on-edge lithography.

A novel-shaped plasmonic chiral nanomaterial exhibiting circular dichroism in the near-infrared spectral range is presented. Applying on-edge lithography, a large area with these nanostructures is efficiently covered. This fabrication method offers tunability of the operation bandwidth by tailoring the chiral shape.

Angular bandpass filters based on dielectric resonant waveguide gratings.

We report on a novel concept for transmissive optical elements based on resonant waveguide gratings (RWGs), which enables the realization of direction selective filters. Hereby, the broadband reflectivity of an RWG for nearly normal incidence angles is combined with high diffractive efficiency in transmission for a specific angle of incidence. Silicon is used as material with high refractive index and good compatibility with semiconductor fabrication. By adjusting the grating parameters different transmission angles and angular widths of the transmission range are feasible. First experimental results of the introduced filters provide a high transmission up to 63% at an incidence angle of 45° with a full width at half maximum of 20°.